Header Semiconducteur

Semiconducteur

Des applications de l'industrie de semiconducteur
SegmentsEnvironmentElastomersSealing Considerations
Crystal Growth (Pulling)25 to 200 C .001 - .01 torrFKMHigh thermal stability, chemical resistance, good vacuum performance
Thermal (LPCVD) Nitride, Oxide, ...23 to 300 C .5 - 1.0 torrFKM, VMQ, FFKMHigh thermal stability, chemical resistance, good vacuum performance
Track & Lithography25 to 100 C ambientFKM, EPDM FFKM (AU)Chemical resistance - solvents
Dry Etch25 to 200 C .1 - 1.0 torrFKM, FFKMChemical resistance, plasma resistance, thermal stability, non-black preferred
Wet Etch25 to 200 C ambientFKM, TFE, FFKMChemical resistance, no elemental contamination
Resist Stripping25 to 250 C .001 - .01 torrFVMQ, VMQ, FKM, FFKMChemical resistance - especially oxygen- rich and ozone environment
Cleaning25 to 200 C ambientFKM, FFKMAcid and solvent resistance, some high pH chemical resistance
Chemical Vapor Deposition (CVD)25 to 250 C .001 - .01 torrFKM, FFKMHigh vacuum performance, chemical resistance, thermal stability
Ion Implant25 to 200 C .0000001 torrNBR, FKMUltrahigh vacuum performance, low outgassing and permeation
Physical Vapor Deposition (PVD)25 to 200 C .000001 - .02 torrFKMUltrahigh vacuum performance, low outgassing and permeation
Chemical Mechanical25 to 80 C ambientEPDM, FFKMAbrasion resistance, high pH chemical resistance

Plus d'information concernant les joint toriques d'ERIKS pour l'industrie de semiconducteur

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Nos clients
  • ASML
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  • Philips
Nos affiliations
European Sealing Agency
European seals and Gaskets Association
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